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Good Quality PVD Chromium Sputtering Target

Chrome Silicon

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CrSi

Composition

Chrome silicon

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤1000mm,W≤200mm


Product Detail

Product Tags

Our pursuit and company purpose is always to “Always satisfy our consumer requirements”. We keep on to acquire and style and design remarkable high-quality products for each our outdated and new customers and reach a win-win prospect for our consumers as well as us for Good Quality PVD Chromium Sputtering Target, Presently, we’re wanting forward to even higher cooperation with abroad shoppers depending on mutual rewards. You should really feel totally free to make contact with us for more aspects.
Our pursuit and company purpose is always to “Always satisfy our consumer requirements”. We keep on to acquire and style and design remarkable high-quality products for each our outdated and new customers and reach a win-win prospect for our consumers as well as us for China Titanium Target Material and Chromium Target Material, We have constructed strong and long co-operation relationship with an enormous quantity of companies within this business overseas. Immediate and specialist after-sale service supplied by our consultant group has happy our buyers. Detailed Info and parameters from the merchandise will probably be sent to you for any thorough acknowledge. Free samples may be delivered and company check out to our corporation. n Portugal for negotiation is constantly welcome. Hope to get inquiries type you and construct a long-term co-operation partnership.
The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.

CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.Our pursuit and company purpose is always to “Always satisfy our consumer requirements”. We keep on to acquire and style and design remarkable high-quality products for each our outdated and new customers and reach a win-win prospect for our consumers as well as us for Good Quality PVD Chromium Sputtering Target, Presently, we’re wanting forward to even higher cooperation with abroad shoppers depending on mutual rewards. You should really feel totally free to make contact with us for more aspects.
Good Quality China Titanium Target Material and Chromium Target Material, We have constructed strong and long co-operation relationship with an enormous quantity of companies within this business overseas. Immediate and specialist after-sale service supplied by our consultant group has happy our buyers. Detailed Info and parameters from the merchandise will probably be sent to you for any thorough acknowledge. Free samples may be delivered and company check out to our corporation. n Portugal for negotiation is constantly welcome. Hope to get inquiries type you and construct a long-term co-operation partnership.


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