Good Quality 99.99% Pure V Sputtering Target vanadium Target for Magnetron Sputtering
Vanadium
We try for excellence, service the customers”, hopes to be the most effective cooperation workforce and dominator company for staff, suppliers and shoppers, realizes price share and ongoing marketing for Good Quality 99.99% Pure V Sputtering Target vanadium Target for Magnetron Sputtering, Our products are new and old customers consistent recognition and trust. We welcome new and old customers to contact us for future business relations, common development. Let’s speeding in the dark!
We try for excellence, service the customers”, hopes to be the most effective cooperation workforce and dominator company for staff, suppliers and shoppers, realizes price share and ongoing marketing for China V PVD Target and V Target Sputtering, Our solutions have been obtained more and more recognition from foreign clients, and established long term and cooperative relationship with them. We`ll deliver the best service for every customer and sincerely welcome friends to work with us and establish the mutual benefit together.
Vanadium Sputtering Target Description
Vanadium is a hard, ductile metal with a silvery-gray appearance. It is harder than most metals and exhibits good corrosion resistance against alkalis and acids. Its melting point is 1890℃, and boiling point is 3380℃. Its atomic number is 23, and atomic weight is 50.9414. It has a face-centered cubic structure and oxidation states in its compounds of +5, +4, +3 and +2. It has high melting point, ductility, hardness, and corrosion resistance.
Vanadium is extensively used in a number of industries and applications, such as jet engines, high speed air frames, nuclear reactors and alloying of steel.
High purity Vanadium sputtering target is a critical material for solar cells and optical lens coatings.
Chemical Analysis
Purity |
99.7 |
99.9 |
99.95 |
99.99 |
Fe |
≤0.1 |
≤0.05 |
≤0.02 |
≤0.01 |
Al |
≤0.2 |
≤0.05 |
≤0.03 |
≤0.01 |
Si |
≤0.15 |
≤0.1 |
≤0.05 |
≤0.01 |
C |
≤0.03 |
≤0.02 |
≤0.01 |
≤0.01 |
N |
≤0.01 |
≤0.01 |
≤0.01 |
≤0.01 |
O |
≤0.05 |
≤0.05 |
≤0.05 |
≤0.03 |
Impurity in total |
≤0.3 |
≤0.1 |
≤0.05 |
≤0.01 |
Vanadium Sputtering Target Packaging
Our Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Get Contact
RSM’s vanadium sputtering targets offer superb purity and consistency. They are available in a variety of forms, purity, sizes and prices. We specialise in high purity thin film coating materials with excellent properties, as well as the highest possible density and smallest possible average grain size, for die coating, decoration, automotive parts, low E glass, semiconductor integrated circuits, thin film resistors, graphic displays, aerospace, magnetic recording, touch screens, thin film solar cells and other physical vapour deposition (PVD) applications. Please send us an enquiry for current pricing on sputtering targets and other deposition materials not listed.
We try for excellence, service the customers”, hopes to be the most effective cooperation workforce and dominator company for staff, suppliers and shoppers, realizes price share and ongoing marketing for Good Quality 99.99% Pure V Sputtering Target vanadium Target for Magnetron Sputtering, Our products are new and old customers consistent recognition and trust. We welcome new and old customers to contact us for future business relations, common development. Let’s speeding in the dark!
China V PVD Target and V Target Sputteringg, Our solutions have been obtained more and more recognition from foreign clients, and established long term and cooperative relationship with them. We`ll deliver the best service for every customer and sincerely welcome friends to work with us and establish the mutual benefit together.