Wholesale FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Iron Cobalt Tantalum

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Short Description:

Category	Alloy Sputtering Target
Chemical Formula	FeCoTa
Composition	Iron Cobalt Tantalum
Purity	99.9%，99.95%，99.99%
Shape	Plates，Column Targets，arc cathodes，Custom-made
Production Process	Vacuum Melting，PM
Available Size	L≤200mm，W≤200mm

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Iron Cobalt Tantalum targets are usually available in circular shape and critical thin film materials of vertical magnetic recording media. The considerable amount of Tantalum present in the alloy would result in segregation and present undissolved particles. We employ unique production method which could ensure the homogeneity of the microstructure and improve the mechanical properties of the materials.

Product name		FeCoTa
Fe/wt%		Balance	Balance	Balance
Co/wt%		21.6±0.5	21.9±0.5	20.2±0.5
Ta/wt%		41.1±0.8	39.4±0.8	44.3±0.8
Metal impurity content（ppm）	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Gas impurity content（ppm）	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Cobalt Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.

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