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factory Outlets for 99.5%-99.95% High Purity Chromium Sputtering Target Cr Target

Chromium Aluminum

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CrAl

Composition

Chromium Aluminum

Purity

99.7%,99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

It is a good way to enhance our products and solutions and repair. Our mission will be to build creative solutions to consumers with a great experience for factory Outlets for 99.5%-99.95% High Purity Chromium Sputtering Target Cr Target, Our enterprise warmly welcome close friends from everywhere in the environment to go to, examine and negotiate organization.
It is a good way to enhance our products and solutions and repair. Our mission will be to build creative solutions to consumers with a great experience for China Chromium Target and Chrome Plate, With a wide range, good quality, reasonable prices and stylish designs, our solutions are extensively used in beauty and other industries. Our solutions are widely recognized and trusted by users and can meet continuously changing economic and social needs.
The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:

1.     Powder grinding and mixing.

2.    Hot isostatic pressing treatment to get semi-finished products.

3.    Machining the rough chromium aluminum  alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.

During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.It is a good way to enhance our products and solutions and repair. Our mission will be to build creative solutions to consumers with a great experience for factory Outlets for 99.5%-99.95% High Purity Chromium Sputtering Target Cr Target, Our enterprise warmly welcome close friends from everywhere in the environment to go to, examine and negotiate organization.
factory Outlets for China Chromium Target and Chrome Plate, With a wide range, good quality, reasonable prices and stylish designs, our solutions are extensively used in beauty and other industries. Our solutions are widely recognized and trusted by users and can meet continuously changing economic and social needs.


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