Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.
CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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Every single member from our higher effectiveness product sales staff values customers' requires and organization communication for Factory making Wsi2 Sputtering Target - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Greece, Russia, Dominica, We adopted technique and quality system management, based on "customer orientated, reputation first, mutual benefit, develop with joint efforts", welcome friends to communicate and cooperate from all over the world.
By King from Norway - 2018.06.05 13:10
It can be said that this is a best producer we encountered in China in this industry, we feel lucky to work with so excellent manufacturer.
By Elaine from Malaysia - 2017.06.16 18:23
