Factory making Wsi2 Sputtering Target - Alsi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich
Factory making Wsi2 Sputtering Target - Alsi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich Detail:
Aluminum Silicon Sputtering Target Description
The targets are prepared by blending Aluminum and Silicon powders followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape. Our Aluminum Silicon sputtering targets are available in rectangular, circular or custom-made geometric forms, Aluminum content from 10-90% atomic, and feature high purity, homogeneous microstructure, high density and long working life.
Aluminum Silicon is extensively used in automotive, aircraft and construction industries for its unique combination of desirable characteristics, including light weight , good thermal conductivity and mechanical properties. The density of this material is 2.6~2.7g/cm3, thermal conductivity coefficient 101~126W/(m·℃), tensile modulus 71.0GPa, fatigue limit ±45MPa. Aluminum-silicon alloys also possess excellent corrosion resistance, machinability, and weldability. Aluminum-silicon alloys are used in a variety of automotive, aerospace, and consumer product applications, like engine blocks and cylinder liners, pistons, bearing alloy materials, and consumer electronics components.+2. It has high melting point, ductility, hardness, and corrosion resistance.
Vanadium is extensively used in a number of industries and applications, such as jet engines, high speed air frames, nuclear reactors and alloying of steel.
High purity Vanadium sputtering target is a critical material for solar cells and optical lens coatings.
Aluminum Silicon Sputtering Target Packaging
Our Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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RSM’s Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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We try for excellence, service the customers", hopes to be the most effective cooperation workforce and dominator company for staff, suppliers and shoppers, realizes price share and ongoing marketing for Factory making Wsi2 Sputtering Target - Alsi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made – Rich , The product will supply to all over the world, such as: Greece, Turkey, luzern, We insist on "Quality First, Reputation First and Customer First". We are committed to providing high-quality products and good after-sales services. Up to now, our products have been exported to more than 60 countries and areas around the world, such as America, Australia and Europe. We enjoy a high reputation at home and abroad. Always persisting in the principle of "Credit, Customer and Quality", we expect cooperation with people in all walks of life for mutual benefits.
By Hannah from Florida - 2018.09.19 18:37
Hope that the company could stick to the enterprise spirit of "Quality, Efficiency, Innovation and Integrity", it will be better and better in the future.
By Philipppa from Guyana - 2017.06.22 12:49
