Factory made hot-sale Oxide Ceramic Sputtering Target - Niv Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Factory made hot-sale Oxide Ceramic Sputtering Target - Niv Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Nickel Vanadium Sputtering Target Description
Gold is often applicated in the deposition of integrated circuit layer, but AuSi low-melting compound is often formed if Gold is combined with Silicon, which would cause the looseness between different layers. Pure Nickel is a good choice for Adhesive layer, while a Barrier layer is also required between the Nickel and Gold layer to prevent proliferation. Vanadium could perfectly satisfy this requirement with high melting point and capacity of standing high ampere density. Therefore Nickel, Vanadium and Gold are three materials usually applicated in integrated circuit industry. Nickel Vanadium Sputtering Target is manufactured by adding Vanadium into molten Nickel. With low ferromagnetism, it is a good choice for the magnetron sputtering of electronic products, which could produce Nickel layer and Vanadium layer in one time.
Ni-7V wt% Impurity Content
Purity |
Main Component(wt%) |
Impurity Chemicals(≤ppm) |
Impurity In total(≤ppm) |
||||||
V |
Fe |
Al |
Si |
C |
N |
O |
S |
||
99.99 |
7±0.5 |
20 |
30 |
20 |
100 |
30 |
100 |
20 |
100 |
99.95 |
7±0.5 |
200 |
200 |
200 |
100 |
100 |
200 |
50 |
500 |
99.9 |
7±0.5 |
300 |
300 |
300 |
100 |
100 |
200 |
50 |
500 |
Nickel Vanadium Sputtering Target Packaging
Our Nickel Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Get Contact
RSM’s Nickel Vanadium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Product detail pictures:
Related Product Guide:
We stay with the basic principle of "quality initially, services first, steady improvement and innovation to fulfill the customers" for your management and "zero defect, zero complaints" as the quality objective. To perfect our company, we give the goods while using the good high-quality at the reasonable selling price for Factory made hot-sale Oxide Ceramic Sputtering Target - Niv Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Irish, South Africa, Gabon, Our product quality is one of the major concerns and has been produced to meet the customer's standards. "Customer services and relationship" is another important area which we understand good communication and relationships with our customers is the most significant power to run it as a long term business.
By Mona from Lebanon - 2017.09.26 12:12
We have been engaged in this industry for many years, we appreciate the work attitude and production capacity of the company, this is a reputable and professional manufacturer.
By Helen from Russia - 2017.10.13 10:47