Factory Directly supply CrAlSi Sputtering Target for PVD Coating

We have been commitment to supply the competitive price ,excellent products and solutions high-quality, at the same time as fast delivery for Factory Directly supply CrAlSi Sputtering Target for PVD Coating, Standing still today and on the lookout into the long run, we sincerely welcome customers all around the planet to cooperate with us.
We have been commitment to supply the competitive price ,excellent products and solutions high-quality, at the same time as fast delivery for China Sputtering Target and Vacuum Coating Material, We adhere to client 1st, top quality 1st, continuous improvement, mutual advantage and win-win principles. When cooperation together with the customer, we supply shoppers with the highest high-quality of service. Established good business relations using the Zimbabwe buyer inside the business, we’ve got established own brand and reputation. At the identical time, wholeheartedly welcome new and old prospects to our company to go to and negotiate small business.

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

Get Contact

RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.We have been commitment to supply the competitive price ,excellent products and solutions high-quality, at the same time as fast delivery for Factory Directly supply CrAlSi Sputtering Target for PVD Coating, Standing still today and on the lookout into the long run, we sincerely welcome customers all around the planet to cooperate with us.
Factory Directly supply China Sputtering Target and Vacuum Coating Material, We adhere to client 1st, top quality 1st, continuous improvement, mutual advantage and win-win principles. When cooperation together with the customer, we supply shoppers with the highest high-quality of service. Established good business relations using the Zimbabwe buyer inside the business, we’ve got established own brand and reputation. At the identical time, wholeheartedly welcome new and old prospects to our company to go to and negotiate small business.