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Europe style for High Purity Chromium Sputtering Target, Cr Sputtering Targets for PVD Coating Machine

Zirconium Silicon

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

ZrSi

Composition

Zirconium Silicon

Purity

99.5%,99.7%,99.9%,

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

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Zirconium Silicon sputtering target is fabricated by means of vacuum melting and power metallurgy.

The Zirconium present could improve the hardness and corrosion resistance behavior.

Zirconium Silicon target in low in electric conductivity, and could reduce the residual stress, which would improve the stability of coatings and prolong service life. The coatings could be used on Low-E glass for its high consistency and corrosion resistance behavior.

Compared to pure Silicon, High purity Zirconium Silicon sputtering targets could significantly improve the friction resistance of the deposited coating by 4-6 times.

Therefore, Zr-Si is available for many practical applications.

Rich Special Materials is a Manufacturer of Sputtering Target and could produce Zirconium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.We’ve been ready to share our knowledge of internet marketing worldwide and recommend you suitable products at most competitive price ranges. So Profi Tools give you best value of money and we’ve been ready to create with each other with Europe style for High Purity Chromium Sputtering Target, Cr Sputtering Targets for PVD Coating Machine, We attend seriously to produce and behave with integrity, and because of the favor of consumers in the home and abroad in the xxx industry.
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