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Custom High purity NiFe Sputtering Target for thin film coating

Iron Nickel

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

NiFe

Composition

Iron Nickel

Purity

99.9%, 99.95%, 99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤2000mm,W≤300mm


Product Detail

Product Tags

We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of Custom High purity NiFe Sputtering Target for thin film coating, We feel that our warm and experienced company will bring you pleasant surprises as perfectly as fortune.
We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of China Sputter Target for PVD and Target, With the advanced workshop, skilled design team and strict quality control system, based on mid- to high-end marked as our marketing positioning, our merchandise are fast selling onto European and American markets with our own brands such as below Deniya, Qingsiya and Yisilanya.
Iron Nickel Sputtering Target is manufactured by means of Vacuum Melting, Casting and PM. It has a very high magnetic permeability at low field strength.

An Iron Nickel target (Nickel>30 wt%) demonstrates the face-centered cubic structure at room temperature. Conventionally Nickel Iron targets have more than 36% composition of Nickel, and could be divided into four categories: 35%~40% Ni-Fe、45%~50% Ni-Fe、50%~65% Ni-Fe and 70%~81% Ni-Fe. Each could be made into materials with circular, rectangular, or plane magnetic hysteresis loops.

Nickel Iron (Ni-Fe) Sputtering Targets are utilized in a wide range of applications, for example magnetic storage media and EMI shielding devices.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Iron Nickel Sputtering Materials according to Customers’ specifications. We could supply purity 99.99% and our typical compositions: Ni-Fe10at%、N-iFe16at%, Ni-Fe19at%, Ni-Fe20at%, Ni-Fe36at%, Ni-Fe50at%, Ni-Fe70at%. For more information, please contact us.We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of Custom High purity NiFe Sputtering Target for thin film coating, We feel that our warm and experienced company will bring you pleasant surprises as perfectly as fortune.
Custom High purity NiFe Sputtering Target for thin film coating, With the advanced workshop, skilled design team and strict quality control system, based on mid- to high-end marked as our marketing positioning, our merchandise are fast selling onto European and American markets


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