CrAlW Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Chrome Aluminum Tungsten sputtering target is fabricated by means of powder metallurgy to achieve high purity, homogeneous microstructure, high density and high electrical conductivity.

Chrome Aluminum Tungsten alloy is a perfect material for Interconnects and electrodes industries. It has smooth surface, high deposition rate, toughness, dielectric strength, and could be well blend with the substrate material.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Tungsten Sputtering Materials according to Customers’ specifications. Our products feature high purity, homogeneous structure, high density with no segregation, pores or cracks. For more information, please contact us.