CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made
Chromium Aluminum
The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:
1. Powder grinding and mixing.
2. Hot isostatic pressing treatment to get semi-finished products.
3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.
During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.
Our typical AlCr targets and their properties
|
Cr-70Al at% |
Cr-60Al at% |
Cr-50Al at% |
|
|
Purity (%) |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
|
Density（g/cm3） |
3.7 |
4.35 |
4.55 |
|
Grain Size(µm) |
100/50 |
100/50 |
100/50 |
|
Process |
HIP |
HIP |
HIP |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.
