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Cofetazr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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Cofetazr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Cobalt Iron Tantalum Zirconium sputtering target is fabricated by means of vacuum melting. This production process could effectively protect major constituents from oxidation and ensure homogenous microstructure, uniformed grain size and high consistency of the deposited films.

After heat treatment, the PTF of the target could be significantly improved, so it is often used for the soft magnetic layer material in perpendicular magnetic recording layers.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Tantalum Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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We usually keep on with the principle "Quality To start with, Prestige Supreme". We've been fully committed to offering our purchasers with competitively priced excellent solutions, prompt delivery and skilled support for Cofetazr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Croatia, Naples, Florida, We honor ourselves as a company that comprises of a strong team of professionals who are innovative and well experienced in the international trading, business development and product advancement. Moreover, the company stays unique among its competitors due to its superior standard of quality in production, and its efficiency and flexibility in business support.
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