Wholesale China Supplier Iron Hafnium Fehf Sputtering Target - WMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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Dependable high-quality and fantastic credit standing are our principles, which will help us at a top-ranking position. Adhering to your tenet of "quality very first, client supreme" for Cobalt Nickel Chromium Molybdenum Conicrmo Sputtering Target , Manganese Mn Sputtering Target , Molybdenum Disilicide Sputtering Target , You should send us your specifications and requirements, or feel totally free to speak to us with any questions or inquiries that you may have.

China Supplier Iron Hafnium Fehf Sputtering Target - WMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Vanadium Sputtering Target Description

Vanadium is a hard, ductile metal with a silvery-gray appearance. It is harder than most metals and exhibits good corrosion resistance against alkalis and acids. Its melting point is 1890℃, and boiling point is 3380℃. Its atomic number is 23, and atomic weight is 50.9414. It has a face-centered cubic structure and oxidation states in its compounds of +5, +4, +3 and +2. It has high melting point, ductility, hardness, and corrosion resistance.

Vanadium is extensively used in a number of industries and applications, such as jet engines, high speed air frames, nuclear reactors and alloying of steel.

High purity Vanadium sputtering target is a critical material for solar cells and optical lens coatings.

Chemical Analysis

Purity	99.7	99.9	99.95	99.99
Fe	≤0.1	≤0.05	≤0.02	≤0.01
Al	≤0.2	≤0.05	≤0.03	≤0.01
Si	≤0.15	≤0.1	≤0.05	≤0.01
C	≤0.03	≤0.02	≤0.01	≤0.01
N	≤0.01	≤0.01	≤0.01	≤0.01
O	≤0.05	≤0.05	≤0.05	≤0.03
Impurity in total	≤0.3	≤0.1	≤0.05	≤0.01

Vanadium Sputtering Target Packaging

Our Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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RSM’s Vanadium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Our focus on should be to consolidate and enhance the quality and repair of present products, in the meantime constantly establish new products to meet unique customers' requires for China Supplier Iron Hafnium Fehf Sputtering Target - WMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: kazan, venezuela, Mumbai, Providing the best products, the most perfect service with the most reasonable prices are our principles. We also welcome OEM and ODM orders.Dedicated to strict quality control and thoughtful customer service, we are always available to discuss your requirements and ensure full customer satisfaction. We sincerely welcome friends to come negotiate business and start cooperation.

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This company conforms to the market requirement and joins in the market competition by its high quality product, this is an enterprise that have Chinese spirit.