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China Supplier Iron Hafnium Fehf Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich

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China Supplier Iron Hafnium Fehf Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich Detail:

Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target,
CoFeTaZr target,
Chromium cobalt sputtering target from Rich Special Materials is a silvery alloy sputtering material containing Cr and Co.

Chromium

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Cobalt

Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Chronium Cobalt Sputtering Targets are manufactured by means of Vacuum Melting and PM. CrCo has superior specific strength and has been used in various fields where high wear-resistance was needed including aerospace industry, cutlery, bearings, blades, etc.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Cobalt Sputtering Materials according to Customers’ specifications. For more information, please contact us.Zirconium iron cobalt tantalum target material is made of high purity cobalt, iron, tantalum, zirconium by high vacuum melting of target material, the technology can effectively control the oxygen content of the target product and the use of special cooling of the mold, is alloy liquid rapid cooling, the alloy target material uniform structure, uniform composition distribution, small, through high temperature and high pressure densification processing, make the material is very dense, This provides a guarantee for the sputtering of high quality films. After heat treatment, the magnetic head ratio (PTF) of the target is significantly increased, and the thin films deposited by the cobalt-iron-tantalum-zirconium target are important soft magnetic layers in the vertical magnetic recording film.


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China Supplier Iron Hafnium Fehf Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich detail pictures


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With our abundant experience and considerate products and services, we have been recognized to be a reputable supplier for a lot of global consumers for China Supplier Iron Hafnium Fehf Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich , The product will supply to all over the world, such as: Florida, Nepal, Saudi Arabia, We have advanced production technology, and pursuit innovative in products. At the same time, the good service has enhanced the good reputation. We believe that as long as you understand our product, you must be willing to become partners with us. Looking forward to your inquiry.
  • Adhering to the business principle of mutual benefits, we have a happy and successful transaction, we think we will be the best business partner.
    5 Stars By Diego from India - 2017.11.29 11:09
    This manufacturers not only respected our choice and requirements, but also gave us a lot of good suggestions, ultimately, we successfully completed the procurement tasks.
    5 Stars By olivier musset from Bangkok - 2018.10.09 19:07