China Supplier Iron Hafnium Fehf Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
China Supplier Iron Hafnium Fehf Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Iron Tantalum Zirconium sputtering target is fabricated by means of vacuum melting. This production process could effectively protect major constituents from oxidation and ensure homogenous microstructure, uniformed grain size and high consistency of the deposited films.
After heat treatment, the PTF of the target could be significantly improved, so it is often used for the soft magnetic layer material in perpendicular magnetic recording layers.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Tantalum Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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We always believe that one's character decides products' quality, the details decides products' high-quality ,together with the REALISTIC,EFFICIENT AND INNOVATIVE crew spirit for China Supplier Iron Hafnium Fehf Sputtering Target - CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Albania, Manila, Slovakia, To let customers be more confident in us and get the most comfortable service, we run our company with honesty, sincerity and best quality . We firmly believe that it is our pleasure to help customers to run their business more successfully, and that our professional advice and service can lead to more suitable choice for the customers.
By Mabel from Libya - 2018.11.06 10:04
We feel easy to cooperate with this company, the supplier is very responsible, thanks.There will be more in-depth cooperation.
By Mike from New Zealand - 2018.06.12 16:22