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China Supplier for 4N 99.99% High Purity Aluminum planar Sputtering Target

Aluminum

Short Description:

Category Metal Sputtering Target
Chemical Formula Al
Composition Aluminum
Purity 99.9%99.95%99.99%
Shape PlatesColumn Targetsarc cathodesCustom-made
Production Process Vacuum Melting
Available Size L≤3000mmW≤300mm

Product Detail

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We emphasize advancement and introduce new products into the market each year for China Supplier for 4N 99.99% High Purity Aluminum planar Sputtering Target, We sincerely do our best to provide the most beneficial assistance for many of the shoppers and businessmen.
We emphasize advancement and introduce new products into the market each year for China rotary target and tubular target, Our business activities and processes are engineered to make sure our customers have access to widest range of products with the shortest supply time lines. This achievement is made possible by our highly skilled and experienced team. We look for people who want to grow with us around the globe and stand out from the crowd. We now have people who embrace tomorrow, have vision, love stretching their minds and going far beyond what they thought was achievable.

Aluminum a lightweight silvery white metal with symbol Al and atomic number 13. It is soft, ductile, corrosion resistant and has a high electrical conductivity.

When the surface of aluminum is exposed to air, a protective oxide coating would form almost instantaneously. This oxide layer is corrosion resistant and can be further enhanced with surface treatments such as anodizing. Aluminum is an excellent thermal and electric conductor. Aluminum is one of the lightest engineering, the conductivity of aluminum is around twice that of copper by weight, which is the first consideration in its use as large power transmission lines, electrical conduction applications including domestic wiring, overhead and high voltage power lines.

Aluminum sputtering target is widely used in the formation of thin films for semiconductors, capacitors, decorations, integrated circuit, and flat panel display. Aluminum targets would be the first candidates if the demand could be satisfied for its cost-saving advantage.

Symbol Al
Relative Molecular Mass 26.98 Latent Heat of Vaporization 11.4J
Atomic Volume 9.996*10-6 Vapor Tension 660/10-8-10-9
Crystalline FCC Conductivity 37.67S/m
Bulk Density 74% Resistance Coefficient +0.115
Coordination Number 12 Absorption Spectrum 0.20*10-24
Lattice Energy 200*10-7 Poisson’s Ratio 0.35
Density 2.7g/cm3 Compressibility 13.3mm2/MN
Elastic Modulus 66.6Gpa Melting Point 660.2
Shear Modulus 25.5Gpa Boiling Point 2500

Rich Special Materials is a Manufacturer of Sputtering Target and could produce high purity Aluminum Sputtering Materials with purity up to 6N according to Customers’ specifications. For more information, please contact us.

We emphasize advancement and introduce new products into the market each year for China Supplier for 4N 99.99% High Purity Aluminum Disc Sputtering Target, We sincerely do our best to provide the most beneficial assistance for many of the shoppers and businessmen.
China Supplier for China rotary target and planar target, Our business activities and processes are engineered to make sure our customers have access to widest range of products with the shortest supply time lines. This achievement is made possible by our highly skilled and experienced team. We look for people who want to grow with us around the globe and stand out from the crowd. We now have people who embrace tomorrow, have vision, love stretching their minds and going far beyond what they thought was achievable.


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