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China New Product Plasma Spraying - Manufacture Price Nickel Chromium Target Ni-Cr 60 wt% High Purity 99.99% Ni Cr Alloy Sputtering Target for PVD – Rich

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China New Product Plasma Spraying - Manufacture Price Nickel Chromium Target Ni-Cr 60 wt% High Purity 99.99% Ni Cr Alloy Sputtering Target for PVD – Rich Detail:

Manufacture Price Nickel Chromium Target Ni-Cr 60 wt% High Purity 99.99% Ni Cr Alloy Sputtering Target for PVD,
Nickel Chromium Target Manufacture price Alloy Sputtering Target,
Chromium cobalt sputtering target from Rich Special Materials is a silvery alloy sputtering material containing Cr and Co.

Chromium

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Cobalt

Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Chronium Cobalt Sputtering Targets are manufactured by means of Vacuum Melting and PM. CrCo has superior specific strength and has been used in various fields where high wear-resistance was needed including aerospace industry, cutlery, bearings, blades, etc.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Cobalt Sputtering Materials according to Customers’ specifications. For more information, please contact us.With its good performance of antioxidation and corrosion resisting, NiCr alloy sputtering target It is extensively used in many industrial applications, such as Low-E glass, micro-electronics, magnetic recording, semiconductor, and thin film resistor.
Nickel Chromium Sputtering Target is widely used in the glass coating industry, including automotive glass coating, in order to reduce the reflection, increase the transmittance of light, and solve the ghost image problem. In addition, PVD coating could slow the rate of aging and extend the useful life of products.
Low-E, or low-emissivity, glass was created to minimize the amount of infrared and ultraviolet light that comes through your glass, without minimizing the amount of light that enters your home. Low-E glass windows have thin coatings that are transparent and reflect heat, keeping the temperature consistent by reflecting the interior temperatures back inside. Nickel Chromium is often deposited outermost to function as antioxidation and corrosion resisting layer.
Thin film resistor produced by Nickel Chromium alloy has many advantages: high Resistivity, low Temperature Coefficient and high Sensitivity, and widely used in different industries including Resistance Strain Gauge.


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China New Product  Plasma Spraying - Manufacture Price Nickel Chromium Target  Ni-Cr 60 wt% High Purity  99.99% Ni Cr Alloy Sputtering Target for PVD – Rich detail pictures


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