China Manufacturer for Coating Material Nickel Vanadium Alloy Sputtering Target
Nickel Vanadium
No matter new customer or previous client, We believe in prolonged time period and trustworthy relationship for China Manufacturer for Coating Material Nickel Vanadium Alloy Sputtering Target, Our items have exported to North America, Europe, Japan, Korea, Australia, New Zealand, Russia and other countries. On the lookout ahead to make up a good and long-lasting cooperation with you in coming potential!
No matter new customer or previous client, We believe in prolonged time period and trustworthy relationship for China Ni V Alloy Sputtering Target and Nickel Vanadium Alloy Sputtering Target, We aim to become the modern enterprise with the commercial ideal of “Sincerity and confidence” and with the aim of “Offering customers the most sincere services and best quality products”. We sincerely ask for your unchanged support and appreciate your kind advice and guidance.
Nickel Vanadium Sputtering Target Description
Gold is often applicated in the deposition of integrated circuit layer, but AuSi low-melting compound is often formed if Gold is combined with Silicon, which would cause the looseness between different layers. Pure Nickel is a good choice for Adhesive layer, while a Barrier layer is also required between the Nickel and Gold layer to prevent proliferation. Vanadium could perfectly satisfy this requirement with high melting point and capacity of standing high ampere density. Therefore Nickel, Vanadium and Gold are three materials usually applicated in integrated circuit industry. Nickel Vanadium Sputtering Target is manufactured by adding Vanadium into molten Nickel. With low ferromagnetism, it is a good choice for the magnetron sputtering of electronic products, which could produce Nickel layer and Vanadium layer in one time.
Ni-7V wt% Impurity Content
Purity |
Main Component(wt%) |
Impurity Chemicals(≤ppm) |
Impurity In total(≤ppm) |
||||||
V |
Fe |
Al |
Si |
C |
N |
O |
S |
||
99.99 |
7±0.5 |
20 |
30 |
20 |
100 |
30 |
100 |
20 |
100 |
99.95 |
7±0.5 |
200 |
200 |
200 |
100 |
100 |
200 |
50 |
500 |
99.9 |
7±0.5 |
300 |
300 |
300 |
100 |
100 |
200 |
50 |
500 |
Nickel Vanadium Sputtering Target Packaging
Our Nickel Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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RSM’s Nickel Vanadium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.No matter new customer or previous client, We believe in prolonged time period and trustworthy relationship for China Manufacturer for Coating Material Nickel Vanadium Alloy Sputtering Target, Our items have exported to North America, Europe, Japan, Korea, Australia, New Zealand, Russia and other countries. On the lookout ahead to make up a good and long-lasting cooperation with you in coming potential!
China Manufacturer for China Ni V Alloy Sputtering Target and Nickel Vanadium Alloy Sputtering Target, We aim to become the modern enterprise with the commercial ideal of “Sincerity and confidence” and with the aim of “Offering customers the most sincere services and best quality products”. We sincerely ask for your unchanged support and appreciate your kind advice and guidance.