Bottom price CrAlSi Sputtering Target for PVD Coating

We know that we only thrive if we will guarantee our combined cost competiveness and high-quality advantageous at the same time for Bottom price CrAlSi Sputtering Target for PVD Coating, We will make greater efforts to help domestic and international buyers, and create the mutual benefit and win-win partnership between us. we are eagerly waiting for your sincerely cooperation.
We know that we only thrive if we will guarantee our combined cost competiveness and high-quality advantageous at the same time for China Sputtering Target and Vacuum Coating Material, After years of development, we have formed strong ability in new product development and strict quality control system to ensure excellent quality and service. With the support of many long term cooperated customers, our items are welcomed all over the world.

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.We know that we only thrive if we will guarantee our combined cost competiveness and high-quality advantageous at the same time for Bottom price CrAlSi Sputtering Target for PVD Coating, We will make greater efforts to help domestic and international buyers, and create the mutual benefit and win-win partnership between us. we are eagerly waiting for your sincerely cooperation.
Bottom price China Sputtering Target and Vacuum Coating Material, After years of development, we have formed strong ability in new product development and strict quality control system to ensure excellent quality and service. With the support of many long term cooperated customers, our items are welcomed all over the world.