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Best quality CrAlSi Sputtering Targets for Vacuum Coating/PVD Coating

Chrome Aluminum Silicon

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CrAlSi

Composition

Chrome aluminum silicon

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤1000mm,W≤200mm


Product Detail

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With our rich experience and considerate services, we have been recognized as a reliable supplier for many international buyers for Best quality CrAlSi Sputtering Targets for Vacuum Coating/PVD Coating, For even more inquires make sure you will not wait to make contact with us. Thank you – Your help continuously inspires us.
With our rich experience and considerate services, we have been recognized as a reliable supplier for many international buyers for China CrAlSi Tagers and CrAlSi Sputtering Targets, We’ve been always creating new technology to streamline the production, and give products with competitive prices and high quality! Customer satisfaction is our priority! You can let us know your idea to develop unique design for your own model to prevent too much similar parts in the market! We are going to present our best service to satisfy all your needs! Remember to contact us right away!

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.With our rich experience and considerate services, we have been recognized as a reliable supplier for many international buyers forBest quality CrAlSi Sputtering Targets for Vacuum Coating/PVD Coating , For even more inquires make sure you will not wait to make contact with us. Thank you – Your help continuously inspires us.
Best quality China CrAlSi Tagers and CrAlSi Sputtering Targets, We’ve been always creating new technology to streamline the production, and give products with competitive prices and high quality! Customer satisfaction is our priority! You can let us know your idea to develop unique design for your own model to prevent too much similar parts in the market! We are going to present our best service to satisfy all your needs! Remember to contact us right away!


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