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Best quality 99.95% Nickel Alloy Target Niv7% Nickel Vanadium Disc

Nickel Vanadium

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

NiV

Composition

Nickel Vanadium

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤4000mm,W≤350mm


Product Detail

Product Tags

The organization keeps into the procedure concept “scientific administration, premium quality and effectiveness primacy, consumer supreme for Best quality 99.95% Nickel Alloy Target Niv7% Nickel Vanadium Disc, Created items with brand worth. We attend seriously to produce and behave with integrity, and from the favor of buyers in your house and abroad from the xxx industry.
The organization keeps into the procedure concept “scientific administration, premium quality and effectiveness primacy, consumer supreme for China Nickel Vanadium Alloy Sputtering Target and Niv7% Nickel Alloy Target, We always insist on the management tenet of “Quality is First, Technology is Basis, Honesty and Innovation”.We are able to develop new products continuously to a higher level to satisfy different needs of customers.

Nickel Vanadium Sputtering Target Description

Gold is often applicated in the deposition of integrated circuit layer, but AuSi low-melting compound is often formed if Gold is combined with Silicon, which would cause the looseness between different layers. Pure Nickel is a good choice for Adhesive layer, while a Barrier layer is also required between the Nickel and Gold layer to prevent proliferation. Vanadium could perfectly satisfy this requirement with high melting point and capacity of standing high ampere density. Therefore Nickel, Vanadium and Gold are three materials usually applicated in integrated circuit industry. Nickel Vanadium Sputtering Target is manufactured by adding Vanadium into molten Nickel. With low ferromagnetism, it is a good choice for the magnetron sputtering of electronic products, which could produce Nickel layer and Vanadium layer in one time.

Ni-7V wt% Impurity Content

Purity

Main Component(wt%)

Impurity Chemicals(≤ppm)

Impurity In total(≤ppm)

V

Fe

Al

Si

C

N

O

S

99.99

7±0.5

20

30

20

100

30

100

20

100

99.95

7±0.5

200

200

200

100

100

200

50

500

99.9

7±0.5

300

300

300

100

100

200

50

500

Nickel Vanadium Sputtering Target Packaging

Our Nickel Vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

RSM’s Nickel Vanadium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.The organization keeps into the procedure concept “scientific administration, premium quality and effectiveness primacy, consumer supreme for Best quality 99.95% Nickel Alloy Target Niv7% Nickel Vanadium Disc, Created items with brand worth. We attend seriously to produce and behave with integrity, and from the favor of buyers in your house and abroad from the xxx industry.
Best quality China Nickel Vanadium Alloy Sputtering Target and Niv7% Nickel Alloy Target, We always insist on the management tenet of “Quality is First, Technology is Basis, Honesty and Innovation”.We are able to develop new products continuously to a higher level to satisfy different needs of customers.


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