Wholesale AlTi alloy Sputtering Target High Purity Manufacturer and Supplier

Aluminum Titanium

AlTi alloy Sputtering Target High Purity Featured Image

Short Description:

Category	Alloy Sputtering Target
Chemical Formula	AlTi
Composition	Aluminum Titanium
Purity	99.9%，99.95%，99.99%
Shape	Plates，Column Targets，arc cathodes，Custom-made
Production Process	Vacuum Melting，PM
Available Size	L≤2000mm，W≤200mm

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The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. The uniform microstructure of the target directly affects the sputtering performance. We have a completed quality management system and we select high purity raw materials and thoroughly blend them to ensure homogeneity. Aluminum Titanium alloy sputtering target is produced by means of vacuum hot pressing method.

Our Aluminum Titanium sputtering targets could provide an outstanding oxidation-resistant nitride coating, Titanium aluminum nitride (TiAlN). TiAlN is the current mainstream as a film for cutting tools, sliding parts and tribo-coatings. It has high hardness, toughness, wear resistant performance and oxidation temperature.

Our typical AlTi targets and their properties

	Ti-75Al at%	Ti-70Al at%	Ti-67Al at%	Ti-60Al at%	Ti-50Al at%	Ti-30Al at%	Ti-20Al at%	Ti-14Al at%
Purity (%)	99.7	99.7	99.7	99.7	99.8/99.9	99.9	99.9	99.9
Density（g/cm³）	3.1	3.2	3.3	3.4	3.63/3.85	3.97	4.25	4.3
Grain Size(µm)	100	100	100	100	100/-	-	-	-
Process	HIP	HIP	HIP	HIP	HIP/VAR	VAR	VAR	VAR

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Titanium Sputtering Materials according to Customers’ specifications. We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made, and wide proportion range of Aluminum. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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