AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made
Aluminum-Tantalum
The targets are prepared by blending Aluminum and Tantalum powders or vacuum melting followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape.
Aluminum Tantalum sputtering target has high purity, homogeneous microstructure and excellent conductivity. It is widely used in the formation of thin films for flat panel display industry. Aluminum Tantalum could also be added to produce high performance Titanium alloy to improve its high-temperature suitability.
Impurity content of Al-Ta alloy
|
composition |
Content（%） |
||||
|
Ta |
Fe |
Si |
C |
O |
|
|
AlTa60 |
55.0~65.0 |
≤0.05 |
≤0.02 |
≤0.01 |
≤0.05 |
|
AlTa70 |
65.0~75.0 |
≤0.05 |
≤0.02 |
≤0.01 |
≤0.05 |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Tantalum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.
