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AlNb Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Aluminium Niobium

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

AlNb

Composition

Aluminium Niobium

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

The targets are prepared by blending Aluminum and Niobium powders followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape. It has high purity, homogeneous microstructure, simple process method and competitive cost, and is used in a number of applications and industries.

Aluminum-niobium alloys present considerable strength and hardness, excellent chemical stability, and are perfect for environments with an elevated temperature level. Besides,Nb-Al alloy could be used as superconductivity materials. It features high melting point and low density, and is extensively used in aerospace, marine, industrial gas turbine, aircraft, nuclear reactor fuel, petrochemical equipment industries. Aluminum-niobium alloys are also the important addition to produce high performance Titanium alloy.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Niobium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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