99.95% Chromium Sputtering Target, Pure Cr Target for PVD Coating

We intention to see quality disfigurement within the creation and supply the ideal support to domestic and overseas buyers wholeheartedly for 99.95% Chromium Sputtering Target, Pure Cr Target for PVD Coating, “Quality initially, Price tag least expensive, Company best” may be the spirit of our organization. We sincerely welcome you to definitely visit our firm and negotiate mutual organization!
We intention to see quality disfigurement within the creation and supply the ideal support to domestic and overseas buyers wholeheartedly for China Chromium Target and Chrome Plate, Our company will continue to adhere to the ” superior quality, reputable, the user first ” principle wholeheartedly. We warmly welcome friends from all walks of life to visit and give guidance, work together and create a brilliant future!

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.We intention to see quality disfigurement within the creation and supply the ideal support to domestic and overseas buyers wholeheartedly for 99.95% Chromium Sputtering Target, Pure Cr Target for PVD Coating, “Quality initially, Price tag least expensive, Company best” may be the spirit of our organization. We sincerely welcome you to definitely visit our firm and negotiate mutual organization!
China Chromium Target and Chrome Plate, Our company will continue to adhere to the ” superior quality, reputable, the user first ” principle wholeheartedly. We warmly welcome friends from all walks of life to visit and give guidance, work together and create a brilliant future!