2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Chromium Tantalum sputtering target is manufactured by casting process and vacuum melting. and are then formed into the desired target shape. It has high purity and homogenous microstructure. Co-Cr-Ta used to be the critical material for magnetic recording for its magnetic properties: high coercivity, low noise property and excellent squareness.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Chromium Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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We have quite a few great team customers very good at internet marketing, QC, and dealing with kinds of troublesome trouble while in the output approach for 2021 China New Design Arc Ion Plating - CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Tajikistan, Colombia, Liberia, Our advanced equipment, excellent quality management, research and development ability make our price down. The price we offering may not be the lowest, but we guarantee it is absolutely competitive! Welcome to contact us immediately for future business relationship and mutual success!
By Poppy from Sydney - 2017.05.02 18:28
The sales manager is very patient, we communicated about three days before we decided to cooperate, finally, we are very satisfied with this cooperation!
By Lauren from Armenia - 2018.07.26 16:51